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A field proven reactor designed to fully respond to the industry's requirements for systems producing low cost EPI films with superior control of critical parameters such as: |
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- Thickness and resistivity uniformity
- Autodoping
- lifetime
- Process flexibility from less than one up to over 200 microns
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The PE 2061S Reactor incorporates 2 reactor chambers with vertical barrel geometry. The machine is an induction heated reactor using a compact, solid state IGBT low frequency generator with dual power output. Due to the IGBT power generator, it is possible to heat one chamber while the other is finishing its process, thus saving cycle time.
The energy is radiated back to the wafer surface thanks to the patented special design of the induction coil. This allows to minimize the thermal gradient across the wafers and minimize power consumption. A lower power consumption implies lower cooling power and, consequently indirect power savings.
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PE 2061S Epitaxial Reactor |
